High-purity chemical packaging containers are an easily overlooked yet critical link in the semiconductor industrial chain.
Recently, BSL (Baoshili) completed the phased verification test on its 200L Ultra-Clean HDPE Drum for metal ion leaching in G5-grade (96%) sulfuric acid. After 8 months of continuous immersion in G5-grade sulfuric acid, the leaching level of each individual metallic impurity was controlled below 10 ppt (parts per trillion), fully meeting the packaging, storage and transportation standards for G5-grade high-purity chemicals.
Metal Ion Leaching Performance of 200L Ultra-Clean HDPE Drum
At present, the localization rate of domestic semiconductor equipment has risen from 8% in 2021 to 23.2% in 2025. Independent controllability of supporting consumables has become a vital task to improve the industrial chain. The phased achievements of BSL’s Ultra-Clean HDPE Drum in the G5-grade sulfuric acid test mark a key milestone for the company in the field of high-end chemical packaging containers.
Behind these test data lies BSL’s innovation capacity in raw material formulation and manufacturing processes. BSL has not only rigorously controlled metal ion leaching of chemicals to the ppt level, but also achieved industry-leading performance in indicators such as particle shedding and ultraviolet transmittance. To date, the Ultra-Clean HDPE Drum has obtained nearly 20 independent intellectual property rights, covering the drum body and relevant supporting components.
Particle Count Performance of 200L Ultra-Clean HDPE Drum
BSL continues to expand its product line of ultra-clean chemical packaging materials. New products including ultra-purified small packaging containers and photoresist packaging containers will be launched successively, delivering a more complete chemical storage and transportation solution for global semiconductor customers.
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